Nanoscribe Opens Shanghai Quantum X Demolab, Strengthening China’s 3D Microfabrication Ecosystem!
Nanoscribe has officially inaugurated its Shanghai Quantum X demolab, marking a significant step in expanding advanced 3D microfabrication capabilities in China and reinforcing the company’s long-term commitment to the region. The new facility was formally commissioned on December 26, 2025, with the installation of the Quantum X align system, Nanoscribe’s next-generation platform based on Aligned Two-Photon Lithography. The inauguration event brought together leading experts from industry and academia, reflecting the growing importance of China as a global hub for photonics, optics, and advanced manufacturing.
At the heart of the Shanghai demolab is the Quantum X align, a high-performance two-photon lithography system designed for ultra-high-resolution 3D laser lithography with automated alignment on fibers, photonic chips, and wafers. The system enables precise fabrication directly on existing components, addressing one of the most critical challenges in scaling micro- and nano-fabrication from research to industrial production. By making this technology available for hands-on evaluation in China, Nanoscribe aims to accelerate innovation cycles and enable faster transfer of research成果 into real-world applications.
Speaking from the company’s headquarters in Germany, Martin Hermatschweiler, CEO and Co-founder of Nanoscribe, highlighted China’s strategic relevance as a fast-growing innovation and engineering ecosystem. He noted that the Shanghai Quantum X demolab represents more than a local presence, positioning it instead as a key milestone in the company’s “lab-to-fab” vision. By providing access to high-throughput two-photon lithography systems, Nanoscribe is enabling customers to bridge the gap between academic proof-of-concept work and scalable industrial manufacturing, particularly in photonics and micro-optical applications.
From a technology perspective, the Quantum X align is powered by Nanoscribe’s proprietary lithography approaches that address both throughput and precision challenges. Two-Photon Grayscale Lithography allows continuous voxel modulation within a single scan, enabling the production of complex freeform micro-optics with optical-grade precision while increasing printing speeds by an order of magnitude compared to conventional methods. At the same time, Aligned Two-Photon Lithography enables highly accurate 3D printing on pre-patterned substrates, achieving lateral alignment accuracy down to 100 nanometers relative to reference markers. This capability is especially important for photonic packaging, where precise placement of optical couplers directly impacts performance and scalability.
The opening event also functioned as a technical symposium, with academic and industrial experts presenting research on topics such as photonic chip coupling, mechanical metamaterials, X-ray optics, and AI-assisted micro-printing. A live demonstration conducted by Nanoscribe’s APAC service team showcased the Quantum X align’s ability to fabricate structures with surface roughness as low as Ra ≤ 10 nanometers and shape accuracy within Sa ≤ 200 nanometers, underscoring its readiness for demanding applications in optical communications, AI infrastructure, and medical devices.
Now fully operational, the Shanghai Quantum X demolab serves as a collaborative platform for demonstration, feasibility evaluation, application development, and targeted training. Customers and partners can validate processes early, reduce development risks, and explore new applications in a controlled environment. Through this facility, Nanoscribe is strengthening its role as a trusted technology partner in China while supporting the country’s push toward high-value innovation driven by advanced 3D microfabrication technologies.
